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Proceedings Paper

A sine-modulated high-intensity UV-LED light source for pressure-sensitive paint applications using fluorescence lifetime imaging technique
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Paper Abstract

The Pressure-Sensitive-Paint (PSP) measurement technique is based on the dependence of the intensity or decay time of its luminescence on the pressure, brought about by oxygen quenching. PSP is usually exited by light of an appropriate wavelength (e.g. UV-light) and its pressure dependent luminescence decay time or lifetime is detected by a camera system (CCD or CMOS). Two basic types of lifetime measurement exist: the first type is a time-domain lifetime method. For this method a pulsed light is used to excite the paint and the pressure dependent time constant is determined from the decay curve of luminescence intensity. The second type is a frequency-domain fluorescence lifetime imaging (FLIM) where sinusoidal modulated light is used to excite the paint and the PSP luminescence is simultaneously detected to calculate its pressure dependent phase shift and amplitude ratio. Based on UV-LEDs a light source has been designed which provides high intensity stable and low distorted sine-modulated light of constant amplitude which is essential for the accuracy of the presented method. The new light source is used to investigate the influence of frequency on pressure sensitivity of a PSP sample to optimize the system for application in transonic wind tunnel tests.

Paper Details

Date Published: 28 January 2019
PDF: 6 pages
Proc. SPIE 11051, 32nd International Congress on High-Speed Imaging and Photonics, 110510C (28 January 2019); doi: 10.1117/12.2524599
Show Author Affiliations
Boleslaw Stasicki, German Aerospace Ctr. (Germany)
Ulrich Henne, German Aerospace Ctr. (Germany)
Krzysztof Ludwikowski, HARDsoft Microprocessor Systems (Poland)
Mizue Munekata, Kumamoto Univ. (Japan)
Daisuke Yorita, German Aerospace Ctr. (Germany)
Gerhard A. Holst, PCO AG Kelheim (Germany)

Published in SPIE Proceedings Vol. 11051:
32nd International Congress on High-Speed Imaging and Photonics
Michel Versluis; Eleanor Stride, Editor(s)

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