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Proceedings Paper

Fabrication and damage characteristics of low stress HR films for femtosecond laser system
Author(s): Guoyun Long; Yaoping Zhang
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Paper Abstract

With the development of femtosecond laser system, the laser damage threshold of optical components becomes more important. Meanwhile, in order to obtain better laser beam quality and avoid wavefront distortion caused by optical components, more stringent requirements are put forward for the surface shape of the coated surface of mirrors. HfO2-SiO2 high reflective films were fabricated by e-beam thermal evaporation method. Internal stress of the multilayer dielectrics was modulated by changing the design of films and coating process. Finally, the film with an absolute internal stress less than 100MPa was obtained. The laser damage characteristics of the films at 35fs, 1000Hz were studied, and the damage mechanism was analyzed.

Paper Details

Date Published: 10 May 2019
PDF: 6 pages
Proc. SPIE 11068, Second Symposium on Novel Technology of X-Ray Imaging, 110681F (10 May 2019); doi: 10.1117/12.2524519
Show Author Affiliations
Guoyun Long, Institute of Optics and Electronics (China)
Univ. of Chinese Academy of Sciences (China)
Yaoping Zhang, Institute of Optics and Electronics (China)

Published in SPIE Proceedings Vol. 11068:
Second Symposium on Novel Technology of X-Ray Imaging
Yangchao Tian; Tiqiao Xiao; Peng Liu, Editor(s)

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