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Proceedings Paper

The in-situ laser induced damage test of fused silica optics with different HF etching depth
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Paper Abstract

The in-situ monitoring of subsurface defects and laser damages initiation using high resolution on-line microscope is performed on medium aperture fused silica optics manufactured by different procedures to investigate the specific damage precursors. The digital camera, Nomarski microscope and white light interferometer are used to characterize the subsurface defects. With shallow HF etching depth, the laser induced damages are mostly initiated on indents or invisible defects under the fluence of 8~10 J/cm2@355nm. The laser induced damages initiated on indents is gradually decreased with the increased etching depth and the laser induced damage density is also decreased. Besides, decrease of the indents by optimizing the polishing process could also make the laser induced damage density sharply decrease. These results prove that the indents are important damage precursors and the laser induced damage performance of fused silica optics could be substantially improved by decreasing the indents or deep HF etching.

Paper Details

Date Published: 10 May 2019
PDF: 9 pages
Proc. SPIE 11068, Second Symposium on Novel Technology of X-Ray Imaging, 110681D (10 May 2019); doi: 10.1117/12.2524489
Show Author Affiliations
Xiang He Sr., Chengdu Fine Optical Engineering Research Ctr. (China)
Gang Wang, Chengdu Fine Optical Engineering Research Ctr. (China)
XuHua Gao, Chengdu Fine Optical Engineering Research Ctr. (China)
Heng Zhao, Chengdu Fine Optical Engineering Research Ctr. (China)
Chao Cai, Chengdu Fine Optical Engineering Research Ctr. (China)
DingYao Yan, Chengdu Fine Optical Engineering Research Ctr. (China)
Ping Ma, Chengdu Fine Optical Engineering Research Ctr. (China)


Published in SPIE Proceedings Vol. 11068:
Second Symposium on Novel Technology of X-Ray Imaging
Yangchao Tian; Tiqiao Xiao; Peng Liu, Editor(s)

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