Proceedings Paper
Stability analysis of ion beam figuring removal function based on line scan| Format | Member Price | Non-Member Price |
|---|---|---|
| $17.00 | $21.00 |
Paper Abstract
In the ion beam figuring(IBF) process, a stable removal function is the premise of ion beam figuring, and the information of removal function is generally obtained by experimental methods. Based on the study of removal function model, the stability of the removal function is analyzed by line scan method. A line scan experiment was performed on a 50mm diameter optical component, within 1h, the removal function's peak removal rate varies in 0.74%, full width at half maximum (FWHM) varies in 0.41%, and volume removal rate varies in 2.62%. The removal function is stable and can be used for actual ion beam figuring. Using this method, the stability of the removal function can be verified to ensure that it satisfies the figuring requirements.
Paper Details
Date Published: 24 January 2019
PDF: 7 pages
Proc. SPIE 11052, Third International Conference on Photonics and Optical Engineering, 110521Q (24 January 2019); doi: 10.1117/12.2523903
Published in SPIE Proceedings Vol. 11052:
Third International Conference on Photonics and Optical Engineering
Ailing Tian, Editor(s)
PDF: 7 pages
Proc. SPIE 11052, Third International Conference on Photonics and Optical Engineering, 110521Q (24 January 2019); doi: 10.1117/12.2523903
Show Author Affiliations
Xu Zhang, Changchun Univ. of Science and Technology (China)
Chunyang Wang, Changchun Univ. of Science and Technology (China)
Dasen Wang, Inner Mongolia Metal Material Research Institute (China)
Chunyang Wang, Changchun Univ. of Science and Technology (China)
Dasen Wang, Inner Mongolia Metal Material Research Institute (China)
Fengming Nie, Inner Mongolia Metal Material Research Institute (China)
Xiaojing Li, Inner Mongolia Metal Material Research Institute (China)
Shi Feng, Changchun Univ. of Science and Technology (China)
Xiaojing Li, Inner Mongolia Metal Material Research Institute (China)
Shi Feng, Changchun Univ. of Science and Technology (China)
Published in SPIE Proceedings Vol. 11052:
Third International Conference on Photonics and Optical Engineering
Ailing Tian, Editor(s)
© SPIE. Terms of Use
