Share Email Print
cover

Proceedings Paper

Transition metal coatings for reflection polarimeters in the 50-100 eV region
Author(s): Fabio Frassetto; Paola Zuppella; Fabio Samparisi; Nicola Fabris; Luca Poletto
Format Member Price Non-Member Price
PDF $17.00 $21.00

Paper Abstract

Spectroscopic experiments requiring the knowledge of the specific state of light polarization for synchrotron radiation, high-order laser harmonics and free-electron lasers are increasing in the recent years. Correspondingly, there has been an increasing demand for systems to measure polarization in the extreme ultraviolet (XUV) and soft X-ray (SX) regions. Polarization can be measured at a specific wavelength through the use of polarizers based on multilayer coatings, that are almost routinely available. The measurement on a broad band requires to operate at grazing incidence with metallic coatings. It is here presented the design and performances of a reflection polarimeter to be used in the 50-100 eV region with transition metal-coated optics. With respect to standard polarimeters, based on gold-coated optics, the presented coatings gives higher flux and higher contrast between phase and reflectivity responses for s- and p-polarized light. The optical and mechanical design of the polarimeter and the estimated throughput are discussed.

Paper Details

Date Published: 24 April 2019
PDF: 9 pages
Proc. SPIE 11038, X-Ray Free-Electron Lasers: Advances in Source Development and Instrumentation V, 110380M (24 April 2019); doi: 10.1117/12.2522256
Show Author Affiliations
Fabio Frassetto, CNR-Istituto di Fotonica e Nanotecnologie (Italy)
Paola Zuppella, CNR-Istituto di Fotonica e Nanotecnologie (Italy)
Fabio Samparisi, CNR-Istituto di Fotonica e Nanotecnologie (Italy)
Univ. degli Studi di Padova (Italy)
Nicola Fabris, CNR-Istituto di Fotonica e Nanotecnologie (Italy)
Univ. degli Studi di Padova (Italy)
Luca Poletto, CNR-Istituto di Fotonica e Nanotecnologie (Italy)


Published in SPIE Proceedings Vol. 11038:
X-Ray Free-Electron Lasers: Advances in Source Development and Instrumentation V
Thomas Tschentscher; Luc Patthey; Kai Tiedtke; Marco Zangrando, Editor(s)

© SPIE. Terms of Use
Back to Top
PREMIUM CONTENT
Sign in to read the full article
Create a free SPIE account to get access to
premium articles and original research
Forgot your username?
close_icon_gray