Share Email Print
cover

Proceedings Paper

Maskless nanolithography on the basis of microfocus x-ray tubes: conversion of electron energy into the BeKα line
Author(s): N. I. Chkhalo; A. Ya. Lopatin; A. E. Pestov; N. N. Salashchenko; G. D. Demin; N. A. Dyuzhev; M. A. Makhiboroda
Format Member Price Non-Member Price
PDF $17.00 $21.00

Paper Abstract

The article describes the status of work on the project of maskless x-ray nanolithography using a chip of transmission microfocus X-ray tubes with field emission cathodes as a dynamic mask device. The basic principles of this method of projection photolithography are considered, and the estimations of the expected throughput of the process are given. A noticeable part of the article is devoted to a model for numerical simulation of the emission characteristics of thin film targets at their exitation with a low energy electrons beam. The experimental results on measurements of the conversion efficiency of electrons energy into soft X-ray radiation of berillium Kα line (λ=11.4 nm) are presented. Other promising materials which could be used as efficient film targets for the mentioned design of maskless nanolithography are proposed.

Paper Details

Date Published: 15 March 2019
PDF: 10 pages
Proc. SPIE 11022, International Conference on Micro- and Nano-Electronics 2018, 110221M (15 March 2019); doi: 10.1117/12.2522105
Show Author Affiliations
N. I. Chkhalo, Institute for Physics of Microstructures (Russian Federation)
A. Ya. Lopatin, Institute for Physics of Microstructures (Russian Federation)
A. E. Pestov, Institute for Physics of Microstructures (Russian Federation)
N. N. Salashchenko, Institute for Physics of Microstructures (Russian Federation)
G. D. Demin, National Research Univ. of Electronic Technology (Russian Federation)
N. A. Dyuzhev, National Research Univ. of Electronic Technology (Russian Federation)
M. A. Makhiboroda, National Research Univ. of Electronic Technology (Russian Federation)


Published in SPIE Proceedings Vol. 11022:
International Conference on Micro- and Nano-Electronics 2018
Vladimir F. Lukichev; Konstantin V. Rudenko, Editor(s)

© SPIE. Terms of Use
Back to Top
PREMIUM CONTENT
Sign in to read the full article
Create a free SPIE account to get access to
premium articles and original research
Forgot your username?
close_icon_gray