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Proceedings Paper

Plasma deposition of carbon-silicon nanocomposite for microelectromechanical applications
Author(s): Evgeny Yu. Gusev; Julia Y. Jityaeva; Sergey A. Lisitsyn; Oleg A. Ageev
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Paper Abstract

The paper presents the technology of forming a nanocomposite based on an array of vertically oriented carbon nanotubes and polycrystalline silicon. The material could be used in fabrication of inertial microelectromechanical system with high aspect ratio structure. Carbon nanotube arrays were grown and coated with a layer of polycrystalline silicon using plasma enhanced chemical vapor deposition. The purpose of the study is to determine experimental conditions for obtaining the nanocomposite with a minimum number of pores in the bulk. The deposition features of the nanocomposite with an intertube distance from 50 to 200 nm are determined. A test array of carbon nanorods (2.5μm in height, aspect ratio ~14) instead of nanotubes is formed for a quantitative analysis in the range of interrod spacing from 500 to 2000 nm. The average deposition rate of silicon at 600°C and 10 W was 15 nm/min on a substrate and 7-8 nm/min along the sidewalls.

Paper Details

Date Published: 15 March 2019
PDF: 5 pages
Proc. SPIE 11022, International Conference on Micro- and Nano-Electronics 2018, 1102224 (15 March 2019); doi: 10.1117/12.2522049
Show Author Affiliations
Evgeny Yu. Gusev, Southern Federal Univ. (Russian Federation)
Julia Y. Jityaeva, Southern Federal Univ. (Russian Federation)
Sergey A. Lisitsyn, Southern Federal Univ. (Russian Federation)
Oleg A. Ageev, Southern Federal Univ. (Russian Federation)


Published in SPIE Proceedings Vol. 11022:
International Conference on Micro- and Nano-Electronics 2018
Vladimir F. Lukichev; Konstantin V. Rudenko, Editor(s)

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