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Proceedings Paper

Induced bistability into quartz glass by silicon wafer heat treatment in lamp-based reactor
Author(s): Valeriya P. Prigara; Vladimir V. Ovcharov
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Paper Abstract

Formulas were derived for the calculation of thermal radiation heat transfer in a radiative-closed thermal system containing two semitransparent gray wafers placed between two opaque wafers. The formulas have universal application and can be used in calculation of a thermal system both with true radiation and with combined mechanisms of heat transfer. On the basis of the obtained relations, thermal transfer has been simulated in a lamp-based reactor including quartz glass that serves for protection of the working chamber against air flow cooling a heating block of the reactor. An induced bistability effect into the quartz glass wafer is confirmed [1] in calculations by the use of real optical properties of heater and absorber materials.

Paper Details

Date Published: 15 March 2019
PDF: 11 pages
Proc. SPIE 11022, International Conference on Micro- and Nano-Electronics 2018, 110221U (15 March 2019); doi: 10.1117/12.2521891
Show Author Affiliations
Valeriya P. Prigara, Institute of Physics and Technology (Russian Federation)
Vladimir V. Ovcharov, Institute of Physics and Technology (Russian Federation)


Published in SPIE Proceedings Vol. 11022:
International Conference on Micro- and Nano-Electronics 2018
Vladimir F. Lukichev; Konstantin V. Rudenko, Editor(s)

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