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Proceedings Paper

Study of Nb-based material combination multilayer for X-ray applications
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Paper Abstract

Nb-based Multilayer Laue Lens (MLL) shows high efficiency and great focusing ability at energy around 18keV theoretically. In this paper, to study the potential of Nb-based material combinations in nano-focusing, a series of Nbbased multilayers: Nb/Si, Nb/Al and Nb/Al(1%wtSi) are fabricated by using direct-current magnetron sputtering technology. Real-time stress measurement is utilized for stress analysis while the quality of multilayers is characterized by XRR and XRD. As a result, Nb presents a crystal state in the Nb/Si multilayer, and shows an asymmetric distribution at the interfaces. Both Nb films and Si films are in a strong compressive stress state, leading to a large total stress. Studies on the Nb/Al and Nb/Al(1%wtSi) multilayers show that both Al and Nb were crystalline under pure Ar sputtering conditions, resulting in large film interface width and poor film quality. The addition of 10% concentration of nitrogen in reactive sputtering can effectively suppress the crystallization of Al and change the crystalline state of Nb. However, the introduction of nitrogen greatly increased the compressive stress of Nb film, resulting in larger stress.

Paper Details

Date Published: 26 April 2019
PDF: 10 pages
Proc. SPIE 11032, EUV and X-ray Optics: Synergy between Laboratory and Space VI, 1103209 (26 April 2019); doi: 10.1117/12.2520851
Show Author Affiliations
Jiayi Zhang, Tongji Univ. (China)
Jingtao Zhu, Tongji Univ. (China)
Jinwen Chen, Tongji Univ. (China)
Bin Ji, Tongji Univ. (China)
Jie Zhu, Tongji Univ. (China)
Miao Li, Tongji Univ. (China)
Shengming Zhu, Tongji Univ. (China)
Mingqi Cui, Beijing Synchrotron Radiation Facility (China)

Published in SPIE Proceedings Vol. 11032:
EUV and X-ray Optics: Synergy between Laboratory and Space VI
René Hudec; Ladislav Pina, Editor(s)

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