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Proceedings Paper

Fabrication of a two-dimensional graded periodic Mo/Si multilayer mirror using magnetron sputtering technology
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Paper Abstract

Aperiodic multilayer structure and lateral gradual multilayer structure can be used to expand spectral bandwidth of multilayer polarizers. To extend application of polarization in EUV and X-ray region, two-dimensional graded multilayer structure is utilized, which is a kind of mirror with gradient period along two lateral directions and can be widely used in synchrotron radiation and polarization studies of magnetic materials. In this paper, a [Mo/Si]25 laterally graded multilayer was deposited on a 40 mm×40 mm large silicon substrate by magnetron sputtering and it was measured by grazing incidence X-ray reflection. The d-spacing gradient along X direction, from 0.0528 nm/mm to 0.116 nm/mm, was achieved by controlling the velocity of the substrate as it passes through the flux. A shaped mask controlled the d-spacing gradient in the Y-axis perpendicular to substrate translation, from 0.12 nm/mm to 0.18 nm/mm. The dspacing was 6.39 nm for the minimum and 15.65 nm for the maximum. This method is capable to prepare twodimensional laterally graded multilayer mirror in EUV and X-ray regions.

Paper Details

Date Published: 26 April 2019
PDF: 6 pages
Proc. SPIE 11032, EUV and X-ray Optics: Synergy between Laboratory and Space VI, 110320R (26 April 2019); doi: 10.1117/12.2520849
Show Author Affiliations
Jinwen Chen, Tongji Univ. (China)
Bin Ji, Tongji Univ. (China)
Jiayi Zhang, Tongji Univ. (China)
Shengming Zhu, Tongji Univ. (China)
Miao Li, Tongji Univ. (China)
Mingqi Cui, Institute of High Energy Physics (China)
Jingtao Zhu, Tongji Univ. (China)
Jie Zhu, Tongji Univ. (China)


Published in SPIE Proceedings Vol. 11032:
EUV and X-ray Optics: Synergy between Laboratory and Space VI
René Hudec; Ladislav Pina, Editor(s)

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