Share Email Print

Proceedings Paper

Investigating EUV radiochemistry with condensed phase photoemission
Author(s): Jonathan Ma; Andrew R. Neureuther; Patrick P. Naulleau
Format Member Price Non-Member Price
PDF $17.00 $21.00

Paper Abstract

In EUV, photoelectrons and secondary electrons play indispensable roles in the chemistry of photoresist. An accurate understanding of electron related processes provides foundation for targeted engineering of resists and other EUV materials. As chemistry is initiated by secondary electrons, acquiring the electron energy distribution inside an actual photoresists is important for improving the efficiency of chemical activation. We demonstrate that condensed phase photoemission spectroscopy can be used as a tool for interrogating electrons in resist and electrons owing from underlayers to resists. The electron energy distribution, albeit different from that measured with condensed phase photoemission spectroscopy, can be recovered computationally. The computational approach involves Monte Carlo simulations using the energy resolved scattering mean free path and the photoemission energy spectra as inputs.

Paper Details

Date Published: 30 May 2019
PDF: 9 pages
Proc. SPIE 10957, Extreme Ultraviolet (EUV) Lithography X, 109571Y (30 May 2019); doi: 10.1117/12.2520391
Show Author Affiliations
Jonathan Ma, Lawrence Berkeley National Lab. (United States)
Univ. of California, Berkeley (United States)
Andrew R. Neureuther, Lawrence Berkeley National Lab. (United States)
Univ. of California, Berkeley (United States)
Patrick P. Naulleau, Lawrence Berkeley National Lab. (United States)

Published in SPIE Proceedings Vol. 10957:
Extreme Ultraviolet (EUV) Lithography X
Kenneth A. Goldberg, Editor(s)

© SPIE. Terms of Use
Back to Top
Sign in to read the full article
Create a free SPIE account to get access to
premium articles and original research
Forgot your username?