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Proceedings Paper

Generation of high-energy mid-infrared pulses via dual-chirped OPA
Author(s): Yuxi Fu; Kotaro Nishimura; Bing Xue; Akira Suda; Katsumi Midorikawa; Eiji J. Takahashi
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Paper Abstract

In recent years, considerable effort has been made to develop high-energy infrared (IR) femtosecond laser sources owing to their advantages for applications in ultrafast and strong-field laser science. In this paper, we show our work on developing TW-class mid-infrared (MIR) femtosecond laser pulses in the 1–4 μm region using a dual-chirped optical parametric amplification (DC-OPA) method, which solved the energy scaling difficulties in standard OPAs. Using a sub-joule class Ti:sapphire laser as a pump for the DC-OPA system, MIR femtosecond pulses with 100-mJ-class energy and a flexible wavelength tunability are confirmed. Efficient energy scaling of DC-OPA is examined experimentally. Moreover, we find different features of DC-OPA from conventional OPA and narrow spectral bandwidth laser pumped optical parametric chirped pulse amplification (OPCPA). Temporal chirps in DC-OPA play critical roles in optimizing efficiency and spectral bandwidth. In addition, bandwidth narrowing of amplified pulses in DC-OPA can be minimized by optimizing the chirps of the seed and pump pulses. DC-OPA can be universally employed for energy scaling of near-IR, MIR, and far-IR pulses, regardless of the type of nonlinear crystal, and is helpful for efficiently generating few-cycle, carrier-envelope phase (CEP)-stable IR pulses with TW-class peak power.

Paper Details

Date Published: 26 April 2019
PDF: 6 pages
Proc. SPIE 11033, High-Power, High-Energy, and High-Intensity Laser Technology IV, 110330K (26 April 2019); doi: 10.1117/12.2519705
Show Author Affiliations
Yuxi Fu, RIKEN (Japan)
Kotaro Nishimura, RIKEN (Japan)
Tokyo Univ. of Science (Japan)
Bing Xue, RIKEN (Japan)
Akira Suda, RIKEN (Japan)
Katsumi Midorikawa, RIKEN (Japan)
Eiji J. Takahashi, RIKEN (Japan)

Published in SPIE Proceedings Vol. 11033:
High-Power, High-Energy, and High-Intensity Laser Technology IV
Joachim Hein; Thomas J. Butcher, Editor(s)

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