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Proceedings Paper • Open Access

Will stochastics be the ultimate limiter for nanopatterning?
Author(s): Chris A. Mack

Paper Abstract

Background: Moore’s Law has to-date governed the economics of lithography-driven scaling in semiconductor manufacturing, where lithography tools provide higher resolution and smaller addressable pixels while maintaining high throughput and lower cost per pixel. On the other hand, Tennant’s Law describes how lithographic throughput decreases dramatically as resolution is improved for a wide range of lithographic approaches.
Aim: Why is there a disconnect between the optical lithography that has enabled decades of Moore’s Law behavior and the many other lithographic techniques that seem to follow Tennant’s Law?
Approach: The answer lies with the concept of stochastic-limited lithography. By developing very simple scaling relationships, a physical explanation for Tennant’s Law can be provided. By applying this explanation to optical lithography, its past can be explained and its potential for future success examined.
Results: While optical lithography has not been stochastic-limited in the past (thus allowing it to avoid the fate of Tennant’s Law), in the future it will surely become stochastic-limited.
Conclusions: The answer to the title question “Will stochastics be the ultimate limiter for nanopatterning?” is clearly yes whenever throughput plays an important role in economic viability.

Paper Details

Date Published: 26 March 2019
PDF: 7 pages
Proc. SPIE 10958, Novel Patterning Technologies for Semiconductors, MEMS/NEMS, and MOEMS 2019, 1095803 (26 March 2019); doi: 10.1117/12.2517598
Show Author Affiliations
Chris A. Mack, Fractilia LLC (United States)


Published in SPIE Proceedings Vol. 10958:
Novel Patterning Technologies for Semiconductors, MEMS/NEMS, and MOEMS 2019
Martha I. Sanchez; Eric M. Panning, Editor(s)

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