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Proceedings Paper • Open Access

The evolution of the Cornell NanoScale Facility and synergies with the semiconductor Industry
Author(s): D. Tennant

Paper Abstract

University fabrication facilities that are both open and shared were created to enable far wider access to tools and methods previously only available to faculty at a few select universities. The lab now known as the Cornell NanoScale Science and Technology Facility (CNF), was the first NSF-supported national user facility in this field about 42 years ago. This talk will consider how open and shared facilities have evolved, and how important it has been to both academic and industrial research in the US. Flexibility and measured changes make CNF and its partners in the National Nanotechnology Coordinated Infrastructure (NNCI) even more relevant going forward as we see technical challenges that must be met due to the explosion in interdisciplinary fields. Some of the needs we see for the future, surprisingly, will have many synergies with the semiconductor industry.

Paper Details

Date Published: 10 June 2019
PDF: 9 pages
Proc. SPIE 10958, Novel Patterning Technologies for Semiconductors, MEMS/NEMS, and MOEMS 2019, 1095802 (10 June 2019); doi: 10.1117/12.2517091
Show Author Affiliations
D. Tennant, Cornell NanoScale Facility (United States)

Published in SPIE Proceedings Vol. 10958:
Novel Patterning Technologies for Semiconductors, MEMS/NEMS, and MOEMS 2019
Martha I. Sanchez; Eric M. Panning, Editor(s)

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