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Proceedings Paper

Variable-wavelength tabletop-scale EUV ptychographic complex imaging reflectometry for 3D composition determination (Conference Presentation)
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Paper Abstract

Full abstract not available at present - I will submit it this week or early next week.

Paper Details

Date Published: 26 March 2019
Proc. SPIE 10959, Metrology, Inspection, and Process Control for Microlithography XXXIII, 109590G (26 March 2019); doi: 10.1117/12.2516827
Show Author Affiliations
Michael Tanksalvala, JILA (United States)
Christina L. Porter, JILA (United States)
Yuka Esashi, JILA (United States)
Galen P. Miley, Northwestern Univ. (United States)
Robert Karl Jr., JILA (United States)
Peter Johnsen, JILA (United States)
Nicholas W. Jenkins, JILA (United States)
Charles S Bevis, JILA (United States)
Bin Wang, JILA (United States)
Jeremy Thurston, JILA (United States)
Xiaoshi Zhang, KM Labs (United States)
Seth L. Cousin, KM Labs (United States)
Daniel E. Adams, JILA (United States)
Michael Gerrity, JILA (United States)
Henry C. Kapteyn, KM Labs (United States)
JILA (United States)
Margaret Murnane., JILA (United States)
KM Labs. (United States)

Published in SPIE Proceedings Vol. 10959:
Metrology, Inspection, and Process Control for Microlithography XXXIII
Vladimir A. Ukraintsev; Ofer Adan, Editor(s)

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