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Proceedings Paper

Upgrade to the SHARP EUV mask microscope
Author(s): Markus Benk; Weilun Chao; Ryan Miyakawa; Kenneth Goldberg; Patrick Naulleau
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Paper Abstract

The Sharp High-NA Actinic Reticle review Project (SHARP) is a synchrotron-based, extreme ultraviolet (EUV) microscope dedicated to photomask research. A potential upgrade to the SHARP microscope is presented. The upgrade includes changing the light path in the instrument from its current off-axis configuration to an on-axis configuration. This change allows for an increased working distance of 2.5 mm or more. A central obscuration, added to the zoneplate aperture, blocks stray light from reaching the central part of the image, thus improving the image contrast. The imaging performance of the two configurations is evaluated by means of ray tracing.

Paper Details

Date Published: 26 March 2019
PDF: 7 pages
Proc. SPIE 10957, Extreme Ultraviolet (EUV) Lithography X, 109570V (26 March 2019); doi: 10.1117/12.2516387
Show Author Affiliations
Markus Benk, Lawrence Berkeley National Lab. (United States)
Weilun Chao, Lawrence Berkeley National Lab. (United States)
Ryan Miyakawa, Lawrence Berkeley National Lab. (United States)
Kenneth Goldberg, Lawrence Berkeley National Lab. (United States)
Patrick Naulleau, Lawrence Berkeley National Lab. (United States)

Published in SPIE Proceedings Vol. 10957:
Extreme Ultraviolet (EUV) Lithography X
Kenneth A. Goldberg, Editor(s)

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