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Proceedings Paper • Open Access

MBMW-201: The next generation multi-beam mask writer (Conference Presentation) (Withdrawal Notice)
Author(s): Christof Klein; Hans Loeschner; Elmar Platzgummer

Paper Abstract

Publisher’s Note: This video, originally published on 16 August 2019, was withdrawn per author request.

Paper Details

Date Published: 2 December 2019
PDF: 1 pages
Proc. SPIE 10958, Novel Patterning Technologies for Semiconductors, MEMS/NEMS, and MOEMS 2019, 109580K (2 December 2019); doi: 10.1117/12.2516033
Show Author Affiliations
Christof Klein, IMS Nanofabrication GmbH (Austria)
Hans Loeschner, IMS Nanofabrication GmbH (Austria)
Elmar Platzgummer, IMS Nanofabrication GmbH (Austria)


Published in SPIE Proceedings Vol. 10958:
Novel Patterning Technologies for Semiconductors, MEMS/NEMS, and MOEMS 2019
Martha I. Sanchez; Eric M. Panning, Editor(s)

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