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Proceedings Paper

ToF-SIMS analysis of antimony carboxylate EUV photoresists
Author(s): Michael Murphy; Shaheen Hasan; Steven Novak; Greg Denbeaux; Robert L. Brainard
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Paper Abstract

Time-of-Flight Secondary Ion Mass Spectrometry (ToF-SIMS) is used to evaluate the composition of nonvolatile photoproducts created by EUV photolysis of antimony carboxylate photoresists [R3Sb(O2CR′)2]. Dozens of potential photoproduct ions were identified using exact mass and 121Sb/123Sb isotopic ratios. Several oxygen-rich antimony ions were found to increase in abundance with exposure. Two methods were employed to identify photoproducts which create solubility contrast. First, samples were analyzed pre- and post-development to examine the effects of EUV exposure and developer solvent on secondary ion intensity. Secondly, changes in intensity of select ions were compared to dissolution contrast over a range of doses. Through these studies, ion intensities were found to correlate with dissolution contrast for several fragments, indicating their active role in creating negative-tone response.

Paper Details

Date Published: 27 March 2019
PDF: 9 pages
Proc. SPIE 10960, Advances in Patterning Materials and Processes XXXVI, 1096010 (27 March 2019); doi: 10.1117/12.2516011
Show Author Affiliations
Michael Murphy, SUNY Polytechnic Institute (United States)
Shaheen Hasan, SUNY Polytechnic Institute (United States)
Steven Novak, SUNY Polytechnic Institute (United States)
Greg Denbeaux, SUNY Polytechnic Institute (United States)
Robert L. Brainard, SUNY Polytechnic Institute (United States)

Published in SPIE Proceedings Vol. 10960:
Advances in Patterning Materials and Processes XXXVI
Roel Gronheid; Daniel P. Sanders, Editor(s)

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