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Proceedings Paper

Oligomers of MORE: Molecular Organometallic Resists for EUV
Author(s): Shaheen Hasan; Michael Murphy; Maximilian Weires; Steven Grzeskowiak; Greg Denbeaux; Robert L. Brainard
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Paper Abstract

The EUV photoproducts of antimony carboxylate photoresists [R3Sb(O2CR′)2] are used to evaluate a possible free radical exposure mechanism by studying the change in molecular weight distribution with dose. We demonstrate the redistribution of carboxylate ligands across the metal centers in solution and use this property to create a statistical mono-olefin resist system with blended solutions of olefinic and non-olefinic antimony compounds that limit crosslinking and improve solubility of the photoproducts. Through gel permeation chromatography (GPC) analysis, we demonstrate the formation of high molecular weight oligomers with exposure dose and provide further support for the free-radical polymerization mechanism.

Paper Details

Date Published: 8 April 2019
PDF: 9 pages
Proc. SPIE 10960, Advances in Patterning Materials and Processes XXXVI, 109601Q (8 April 2019); doi: 10.1117/12.2516010
Show Author Affiliations
Shaheen Hasan, SUNY Polytechnic Institute (United States)
Michael Murphy, SUNY Polytechnic Institute (United States)
Maximilian Weires, SUNY Polytechnic Institute (United States)
Steven Grzeskowiak, SUNY Polytechnic Institute (United States)
Greg Denbeaux, SUNY Polytechnic Institute (United States)
Robert L. Brainard, SUNY Polytechnic Institute (United States)

Published in SPIE Proceedings Vol. 10960:
Advances in Patterning Materials and Processes XXXVI
Roel Gronheid; Daniel P. Sanders, Editor(s)

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