
Proceedings Paper
Evolution of lithographic materials enabling the semiconductor industryFormat | Member Price | Non-Member Price |
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Paper Abstract
Underpinning the Electronic Revolution over the last 50 years is the development of sophisticated patterning materials which have enabled the elegant semiconductor chip design. Of central importance is the photoresist material which has been custom designed for shrinking exposure wavelengths. Polymer chemistry, synthetic organic chemistry, and photochemistry have all played important roles in the design and development of photoresist materials. Ancillary lithographic materials have also been implemented to solve critical lithographic issues such as antireflection control, leaching and outgassing, and pattern transfer. It can be safely stated that without the creative inventions of lithographic materials by chemists and engineers the Electronic Revolution would not happen. This presentation will introduce the critical chemistry and engineering solutions that led to the development of these enabling lithographic materials.
Paper Details
Date Published: 25 March 2019
PDF: 19 pages
Proc. SPIE 10960, Advances in Patterning Materials and Processes XXXVI, 1096013 (25 March 2019); doi: 10.1117/12.2515895
Published in SPIE Proceedings Vol. 10960:
Advances in Patterning Materials and Processes XXXVI
Roel Gronheid; Daniel P. Sanders, Editor(s)
PDF: 19 pages
Proc. SPIE 10960, Advances in Patterning Materials and Processes XXXVI, 1096013 (25 March 2019); doi: 10.1117/12.2515895
Show Author Affiliations
James W. Thackeray, Dow Electronic Materials (United States)
Cheng Bai Xu, Dow Electronic Materials (United States)
Cheng Bai Xu, Dow Electronic Materials (United States)
James F. Cameron, Dow Electronic Materials (United States)
Published in SPIE Proceedings Vol. 10960:
Advances in Patterning Materials and Processes XXXVI
Roel Gronheid; Daniel P. Sanders, Editor(s)
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