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Proceedings Paper • Open Access

EUVL: the natural evolution of optical microlithography
Author(s): Bernd Geh

Paper Abstract

EUV Lithography is ready for High Volume Production, further enabling the printing of ever smaller features. In this keynote, the author will briefly reflect on evolution and future of digital technologies. An overview of the development and major milestones of Lithography lenses – with aberrations being a main focus – from the mid 1990 to today will be presented. Other aspects – like mask 3D effects, Source Mask Optimization, High NA EUV and Stochastic will be discussed.

Paper Details

Date Published: 18 October 2019
PDF: 18 pages
Proc. SPIE 10957, Extreme Ultraviolet (EUV) Lithography X, 1095705 (18 October 2019); doi: 10.1117/12.2515791
Show Author Affiliations
Bernd Geh, Carl Zeiss SMT GmbH (United States)


Published in SPIE Proceedings Vol. 10957:
Extreme Ultraviolet (EUV) Lithography X
Kenneth A. Goldberg, Editor(s)

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