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Proceedings Paper

Improved sub-surface AFM using photothermal actuation
Author(s): Maarten E. v. Reijzen ; Mehmet S. Tamer; Maarten H. v. Es; Martijn v. Riel ; Aliasghar Keyvani; Hamed Sadeghian; Marco v. d. Lans
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Paper Abstract

In this paper, we present an AFM based subsurface measurement technique that can be used for overlay and critical dimensions (CD) measurements through optically opaque layers. The proposed method uses the surface elasticity map to resolve the presence and geometry of subsurface structures. To improve the imaging performance of the AFM based subsurface measurements, we made use of photothermal excitation of the AFM cantilever together with a frequency modulation scheme. The experimental results show a significant improvement in the quality of the image, which leads to a more accurate and reliable CD and overlay measurement.

Paper Details

Date Published: 2 July 2019
PDF: 8 pages
Proc. SPIE 10959, Metrology, Inspection, and Process Control for Microlithography XXXIII, 109590L (2 July 2019); doi: 10.1117/12.2515441
Show Author Affiliations
Maarten E. v. Reijzen , TNO (Netherlands)
Mehmet S. Tamer, TNO (Netherlands)
Maarten H. v. Es, TNO (Netherlands)
Martijn v. Riel , TNO (Netherlands)
Aliasghar Keyvani, TNO (Netherlands)
Hamed Sadeghian, TNO (Netherlands)
Marco v. d. Lans, TNO (Netherlands)

Published in SPIE Proceedings Vol. 10959:
Metrology, Inspection, and Process Control for Microlithography XXXIII
Vladimir A. Ukraintsev; Ofer Adan, Editor(s)

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