Share Email Print

Proceedings Paper

Calibrated PSCAR stochastic simulation
Format Member Price Non-Member Price
PDF $17.00 $21.00

Paper Abstract

Photosensitized Chemically Amplified ResistTM (PSCARTM) has been demonstrated as a promising solution for a high sensitivity resist in EUV lithography mass production. This paper describes the successful calibration of a PSCAR resist model for deployment within rigorous lithography process simulation, capturing continuum as well as stochastic effects. Verification of the calibrated model parameters was performed with new patterns or with new resist formulations with good agreement. The reduction of required EUV dose of PSCAR resist while maintaining similar roughness levels have been achieved both from experimental result and from simulated result. The simulation of PSCAR continues to be a great tool for understanding, predicting, and optimizing the process of PSCAR.

Paper Details

Date Published: 26 March 2019
PDF: 10 pages
Proc. SPIE 10957, Extreme Ultraviolet (EUV) Lithography X, 109571O (26 March 2019); doi: 10.1117/12.2515183
Show Author Affiliations
Cong Que Dinh, Tokyo Electron Kyushu Ltd. (Japan)
Seiji Nagahara, Tokyo Electron Ltd. (Japan)
Gousuke Shiraishi, Tokyo Electron Kyushu Ltd. (Japan)
Yukie Minekawa, Tokyo Electron Kyushu Ltd. (Japan)
Yuya Kamei, Tokyo Electron Kyushu Ltd. (Japan)
Michael Carcasi, Tokyo Electron America, Inc. (United States)
Hiroyuki Ide, Tokyo Electron Kyushu Ltd. (Japan)
Yoshihiro Kondo, Tokyo Electron Kyushu Ltd. (Japan)
Yuichi Yoshida, Tokyo Electron Kyushu Ltd. (Japan)
Kosuke Yoshihara, Tokyo Electron Kyushu Ltd. (Japan)
Ryo Shimada, Tokyo Electron Kyushu Ltd. (Japan)
Masaru Tomono, Tokyo Electron Kyushu Ltd. (Japan)
Teruhiko Moriya, Tokyo Electron Kyushu Ltd. (Japan)
Kazuhiro Takeshita, Tokyo Electron Kyushu Ltd. (Japan)
Kathleen Nafus, Tokyo Electron America, Inc. (United States)
Serge Biesemans, Tokyo Electron Europe Ltd. (Belgium)
John S. Petersen, IMEC (Belgium)
Danilo De Simone, IMEC (Belgium)
Philippe Foubert, IMEC (Belgium)
Peter De Bisschop, IMEC (Belgium)
Geert Vandenberghe, IMEC (Belgium)
Hans-Jürgen Stock, Synopsys GmbH (Germany)
Balint Meliorisz, Synopsys GmbH (Germany)

Published in SPIE Proceedings Vol. 10957:
Extreme Ultraviolet (EUV) Lithography X
Kenneth A. Goldberg, Editor(s)

© SPIE. Terms of Use
Back to Top
Sign in to read the full article
Create a free SPIE account to get access to
premium articles and original research
Forgot your username?