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Proceedings Paper

Start-up performance and pattern defectivity improvement using 2nm rated nylon filter developed with lithography filtration expertise
Author(s): Toru Umeda; Eric Shiu; Takehito Mizuno; Hisashi Nakagawa; Tetsuya Murakami; Shuichi Tsuzuki
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Paper Abstract

A new 2 nm rated Nylon filter was developed to have features required for lithography filtration process such as finer pore size, extended contact time for adsorption enhancement and updated cleanliness for faster start-up. The contact time is extended by 1.6 times of the 10 nm rated product in the same sized capsule filter. Finer pore size is achieved and demonstrated by the removal performance of gold nanoparticles. For start-up performance, particles and metal cleanliness were improved.

To validate the features applied for the new 2 nm Nylon filter, on-wafer tests are conducted in comparison to conventional product such as 5 nm Nylon filter. Filter start up performance is tested with KLA Tencor Surfscan SP5XP inspection on solvent spin coated Si wafer. For bridge defects, 40 nm half pitch after development pattern defectivity with ArF immersion lithography is tested. The new 2 nm rated Nylon 6,6 filter performed best for all the tests. Cleanliness probably played a role in start-up performance. Sieving, which is related to filter pore size was effective in resist coating defectivity. And both the finer pore size and hydrophilic adsorption are effective in after development inspection at 40 nm half pitch L/S pattern, which is nearly the theoretical limit of the ArF immersion lithography.

Paper Details

Date Published: 27 March 2019
PDF: 7 pages
Proc. SPIE 10960, Advances in Patterning Materials and Processes XXXVI, 1096018 (27 March 2019); doi: 10.1117/12.2515163
Show Author Affiliations
Toru Umeda, Nihon Pall Ltd. (Japan)
Eric Shiu, Pall Corp. (United States)
Takehito Mizuno, Nihon Pall Ltd. (Japan)
Hisashi Nakagawa, Nihon Pall Ltd. (Japan)
Tetsuya Murakami, Nihon Pall Ltd. (Japan)
Shuichi Tsuzuki, Nihon Pall Ltd. (Japan)


Published in SPIE Proceedings Vol. 10960:
Advances in Patterning Materials and Processes XXXVI
Roel Gronheid; Daniel P. Sanders, Editor(s)

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