Irresistible Materials has previously introduced the HM340 and HM940 series of fullerene based spin-on carbon hardmasks, and reported on material characterization, including very high carbon content and high thermal stability. The materials have a low Ohnishi number providing high etch durability and the low hydrogen level allows for high-resolution etching without wiggling. In order to further increase thermal stability and etch resistance several new formulations are under development, including fullerene only hardmask materials.

Here we present the latest results for our more conventional HM940 series, avoiding the drain test issues encountered with higher concentration HM340 formulations, together with new and updated characterisation results for the more advanced formulations.

Date Published: 25 March 2019
PDF: 7 pages
Proc. SPIE 10960, Advances in Patterning Materials and Processes XXXVI, 109601B (25 March 2019); doi: 10.1117/12.2515087

Published in SPIE Proceedings Vol. 10960:
Advances in Patterning Materials and Processes XXXVI
Roel Gronheid; Daniel P. Sanders, Editor(s)