
Proceedings Paper
Quantitative tomography with subsurface scanning ultrasound resonance force microscopyFormat | Member Price | Non-Member Price |
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Paper Abstract
Extracting quantitative information about dimensions and material properties of buried structures is continuing
to be an important but difficult task in metrology. Examples of questions asking for this capability include critical
dimension metrology of fins such as the profile (bottom width, top width, height) or the presence and extent of
voids. In recent years TNO has demonstrated the concept of using Atomic Force Microscopy (AFM) in combination
with ultrasound to image buried structures based on their (visco-)elasticity in a technique called Subsurface
Scanning Ultrasound Resonance Force Microscopy (SSURFM). We have successfully imaged structures less than
10nm wide, as well as structures buried up to a micrometer deep. However, extracting quantitative information
from this data is not trivial, as the induced stress field in the sample depends on many parameters in a non-linear
way: experimental parameters such as applied force, tip size and tip shape, and geometry and material properties
of the buried structures themselves. Therefore, measurements based on this technique have a point spread
function which varies in a complicated way with the sample properties that need to be measured. However, a
solid understanding of the physics and mechanics involved, and the modeling of the expected structures and
their response to externally applied stress, enable quantitative measurements. We specifically show our progress
on characterizing a sample comprising fins from a 7nm node manufacturing test run.
Paper Details
Date Published: 2 April 2019
PDF: 5 pages
Proc. SPIE 10959, Metrology, Inspection, and Process Control for Microlithography XXXIII, 109590M (2 April 2019); doi: 10.1117/12.2515048
Published in SPIE Proceedings Vol. 10959:
Metrology, Inspection, and Process Control for Microlithography XXXIII
Vladimir A. Ukraintsev; Ofer Adan, Editor(s)
PDF: 5 pages
Proc. SPIE 10959, Metrology, Inspection, and Process Control for Microlithography XXXIII, 109590M (2 April 2019); doi: 10.1117/12.2515048
Show Author Affiliations
Hamed Sadeghian, TNO Science and Industry (Netherlands)
Published in SPIE Proceedings Vol. 10959:
Metrology, Inspection, and Process Control for Microlithography XXXIII
Vladimir A. Ukraintsev; Ofer Adan, Editor(s)
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