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Proceedings Paper

Substrate conformal imprint lithography: functional resists, overlay performance, and volume production results
Author(s): Marc A. Verschuuren; Korneel Ridderbeek; Rob Voorkamp
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Paper Abstract

We will introduce SCIL as a full-wafer soft-stamp base nanoimprint technique with the advantages of being able to replicate sub-10nm features and perform micron accurate overlay alignment over 200mm wafers. The combination of PDMS based soft stamps and an inorganic crosslinking imprint resist leads to a very long stamp lifetime and the direct patterning of complex deep sub-micron patterns, such as slanted gratings with an index up to n=2.1. These complex patterns are of high interest for nano-photonic enabled applications such AR/VR and metasurfaces with applications such as “perfect” flat lenses. A new analytical model based on hyper-elastic deformation of silicon rubber nano-patterns was developed and is able to accurately predict pattern stability from sub-micron to less than 20nm patterns.

Paper Details

Date Published: 26 March 2019
PDF: 9 pages
Proc. SPIE 10958, Novel Patterning Technologies for Semiconductors, MEMS/NEMS, and MOEMS 2019, 109580D (26 March 2019); doi: 10.1117/12.2514757
Show Author Affiliations
Marc A. Verschuuren, Philips SCIL Nanoimprint Solutions (Netherlands)
Korneel Ridderbeek, Philips SCIL Nanoimprint Solutions (Netherlands)
Rob Voorkamp, Philips SCIL Nanoimprint Solutions (Netherlands)

Published in SPIE Proceedings Vol. 10958:
Novel Patterning Technologies for Semiconductors, MEMS/NEMS, and MOEMS 2019
Martha I. Sanchez; Eric M. Panning, Editor(s)

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