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Proceedings Paper

Process drift compensation by tunable wavelength homing in scatterometry-based overlay
Author(s): Kun Gao; Pedro Herrera; Vidya Ramanathan; Victoria Naipak; Meng Wang; Renan Milo; Tal Yaziv; Nir BenDavid; Chen Dror; Hao Mei; Weihua Li; Xindong Gao; Linfei Gao; Md. Motasim Bellah; Karsten Gutjahr; Dongyue Yang; Cheuk Wun Wong; Xueli Hao; Tony Joung; DeNeil Park; Yue Zhou; Abhishek Gottipati
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Paper Abstract

Shrinking on-product overlay (OPO) budgets in advanced technology nodes require more accurate overlay measurement and better measurement robustness to process variability. Pupil-based accuracy flags have been introduced to the scatterometry-based overlay (SCOL) system to evaluate the performance of a SCOL measurement setup. Wavelength Homing is a new robustness feature enabled by the continuous tunability of advanced SCOL systems using a supercontinuum laser light source in combination with a flexible bandpass filter. Inline process monitoring using accuracy flags allows for detection, quantification and correction of shifts in the optimal measurement wavelength. This work demonstrates the benefit of Wavelength Homing in overcoming overlay inaccuracy caused by process changes and restoring the OPO and residual levels in the original recipe.

Paper Details

Date Published: 26 March 2019
PDF: 7 pages
Proc. SPIE 10959, Metrology, Inspection, and Process Control for Microlithography XXXIII, 1095906 (26 March 2019); doi: 10.1117/12.2514548
Show Author Affiliations
Kun Gao, KLA Corp. (China)
Pedro Herrera, KLA Corp. (United States)
Vidya Ramanathan, KLA Corp. (United States)
Victoria Naipak, KLA Corp. (United States)
Meng Wang, KLA Corp. (United States)
Renan Milo, KLA Corp. (Israel)
Tal Yaziv, KLA Corp. (Israel)
Nir BenDavid, KLA Corp. (Israel)
Chen Dror, KLA Corp. (Israel)
Hao Mei, KLA Corp. (China)
Weihua Li, KLA Corp. (China)
Xindong Gao, KLA Corp. (China)
Linfei Gao, KLA Corp. (China)
Md. Motasim Bellah, GLOBALFOUNDRIES (United States)
Karsten Gutjahr, GLOBALFOUNDRIES (United States)
Dongyue Yang, GLOBALFOUNDRIES (United States)
Cheuk Wun Wong, GLOBALFOUNDRIES (United States)
Xueli Hao, GLOBALFOUNDRIES (United States)
Tony Joung, GLOBALFOUNDRIES (United States)
DeNeil Park, GLOBALFOUNDRIES (United States)
Yue Zhou, GLOBALFOUNDRIES (United States)
Abhishek Gottipati , GLOBALFOUNDRIES (United States)

Published in SPIE Proceedings Vol. 10959:
Metrology, Inspection, and Process Control for Microlithography XXXIII
Vladimir A. Ukraintsev; Ofer Adan, Editor(s)

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