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Proceedings Paper

A programmable UVLED array with a collimated optics as transform lens as light field adjustable source
Author(s): Jiun-Woei Huang
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Paper Abstract

To achieve the smallest line width of IC requires the spherical and coma aberration free lithography optics. Once the aberration of lens is formed, it is hard to amend the mask to original requirement, unless the light pattern figure is adjustable. A programmable UVLED array with a collimated lens as Fourier transfer lens forms an adjustable pattern as the intensity profile to amend the aberration of mask to form aberration free mask intensity pattern into wafer. A 25 X 25 UVLED array with collimated lens is applied to correct the aberration contained mask, is to form a corrected pattern under the requirement for reducing aberration mask to form a smallest line width.

Paper Details

Date Published: 20 March 2019
PDF: 8 pages
Proc. SPIE 10961, Optical Microlithography XXXII, 109610T (20 March 2019); doi: 10.1117/12.2514010
Show Author Affiliations
Jiun-Woei Huang, Instrument Technology Research Ctr. (Taiwan)
National Taiwan Univ. (Taiwan)

Published in SPIE Proceedings Vol. 10961:
Optical Microlithography XXXII
Jongwook Kye; Soichi Owa, Editor(s)

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