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Proceedings Paper

Advances and prospects of thin film phosphor for high resolution field emission displays
Author(s): Dongzhan Zhou; Yong Sun; Kangsheng Huang; Jiuwang Wang; Chen Wang; Chang Liu; Yanglei Xu; Hua Cai; Tiezhu Bo; Hui Liu
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Paper Abstract

With the development of electronic displays becoming flat and portable, field emission displays (FED) get the widespread attention because they have the advantages of flat-panel displays and CRT displays together. At present, as one of the core components in FED, the screen is still the short board in the application of FED. With thin film phosphor as the phosphor layer, the screen will be very beneficial to the application of FED because of many advantages of extremely high resolution, strong adhesion, good smoothness, low release of gas, good conductivity and so on. That highlights the important application value and research significance of thin film phosphor in FED. In this review, we summarize the recent advances in the thin film phosphors for FED with emphasis on the film materials, preparation technology, and the main problems in the film. And the further study of thin film phosphors in FED is also presented.

Paper Details

Date Published: 7 November 2018
PDF: 6 pages
Proc. SPIE 10832, Fifth Conference on Frontiers in Optical Imaging Technology and Applications, 108321Z (7 November 2018); doi: 10.1117/12.2512051
Show Author Affiliations
Dongzhan Zhou, China Building Materials Academy (China)
Yong Sun, China Building Materials Academy (China)
Kangsheng Huang, China Building Materials Academy (China)
Jiuwang Wang, China Building Materials Academy (China)
Chen Wang, China Building Materials Academy (China)
Chang Liu, China Building Materials Academy (China)
Yanglei Xu, China Building Materials Academy (China)
Hua Cai, China Building Materials Academy (China)
Tiezhu Bo, China Building Materials Academy (China)
Hui Liu, China Building Materials Academy (China)

Published in SPIE Proceedings Vol. 10832:
Fifth Conference on Frontiers in Optical Imaging Technology and Applications
Junhao Chu; Wenqing Liu; Huilin Jiang, Editor(s)

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