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Proceedings Paper

Development of surface profile measurement system based on super luminescent diode light source
Author(s): Dian Bian; Xinyu Yan; Yang Lu; Liandong Yu
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Paper Abstract

This paper dedicated to the development of a surface profile measurement system based on the SLD (Super Luminescent Diode) light source for silicon wafer. The silicon wafer is very important as a substrate of semiconductor products such as integrated circuit (IC) chips, light emitting diodes (LEDs), solar cells and MEMS devices [1] . In this paper, Michelson interferometer is used to generate double beams in order to achieve interference. According to the acquired interference fringe image, we obtain the surface profile of the tested silicon wafer. As a light source, SLD has good spatial coherence and due to its higher transmittance to silicon wafers than other wavelength sources, high fringe visibility can be achieved. It can also perform a full scan in a larger step and achieve rapid on-line measurement of the target surface.

Paper Details

Date Published: 7 March 2019
PDF: 5 pages
Proc. SPIE 11053, Tenth International Symposium on Precision Engineering Measurements and Instrumentation, 110530K (7 March 2019); doi: 10.1117/12.2511824
Show Author Affiliations
Dian Bian, Hefei Univ. of Technology (China)
Xinyu Yan, Hefei Univ. of Technology (China)
Yang Lu, Hefei Univ. of Technology (China)
Liandong Yu, Hefei Univ. of Technology (China)

Published in SPIE Proceedings Vol. 11053:
Tenth International Symposium on Precision Engineering Measurements and Instrumentation
Jiubin Tan; Jie Lin, Editor(s)

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