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Proceedings Paper

Non-contact surface temperature mapping of alpha-alumina using a Raman scattering method
Author(s): Juddha Thapa; Steven D. Woodruff; Michael P. Buric; Benjamin T. Chorpening
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Paper Abstract

Alumina ceramic is widely used as a thermocouple protector or engineering ceramic in harsh environments due to its high-temperature stability, chemical inertness, and low thermal conductivity. Because alumina is prevalent in high-temperature equipment, it is useful to understand its Raman properties to enable temperature measurement via Raman spectroscopy in these harsh-environment systems. In this paper, we report temperature mapping on the surface of high-temperature alumina ceramics via Raman spectroscopy. The ceramics studied were as cast (unpolished) to approximate use in high-temperature industrial applications. Temperature calibration equations were generated covering the range from room temperature to ~1000°C. The most accurate mathematical temperature relation used the Raman line shift of the most intense Stokes A1g peak at 418cm-1. The average standard deviation of the Raman temperature measurement was less than 5°C over the entire experimental temperature range. This method will provide accurate non-contact surface temperature measurments in harsh environments where thermal radiation and variable surface emissivity contributes significant error to simpler infrared thermometry.

Paper Details

Date Published: 1 March 2019
PDF: 10 pages
Proc. SPIE 10919, Oxide-based Materials and Devices X, 1091921 (1 March 2019); doi: 10.1117/12.2511792
Show Author Affiliations
Juddha Thapa, National Energy Technology Lab. (United States)
Leidos Research Support Team (United States)
Steven D. Woodruff, National Energy Technology Lab. (United States)
Michael P. Buric, National Energy Technology Lab. (United States)
Benjamin T. Chorpening, National Energy Technology Lab. (United States)

Published in SPIE Proceedings Vol. 10919:
Oxide-based Materials and Devices X
David J. Rogers; David C. Look; Ferechteh H. Teherani, Editor(s)

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