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Proceedings Paper

Temperature rise in thick PMMA resists during x-ray exposure
Author(s): Harish M. Manohara; Gina M. Calderon; J. Michael Klopf; Kevin J. Morris; Olga Vladimirsky; Yuli Vladimirsky
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Paper Abstract

Temperature measurements of thick PMMA resist during X-ray (1 to 5 keV) exposure are presented in this paper. Thin metal (gold) film thermal sensors were fabricated directly on the resist surface and on the resist/substrate interface using micro-lithography methods. The temperature measurements were conducted in vacuum (< 10-4 Torr) and in 1 to 25 Torr helium pressure--conditions corresponding to typically X-ray lithography exposure. The results of temperature rise measurements performed with thermal sensors and with miniature conventional thermocouples are compared.

Paper Details

Date Published: 13 September 1996
PDF: 8 pages
Proc. SPIE 2880, Microlithography and Metrology in Micromachining II, (13 September 1996); doi: 10.1117/12.250950
Show Author Affiliations
Harish M. Manohara, Louisiana State Univ. (United States)
Gina M. Calderon, Louisiana State Univ. (United States)
J. Michael Klopf, Louisiana State Univ. (United States)
Kevin J. Morris, Louisiana State Univ. (United States)
Olga Vladimirsky, Louisiana State Univ. (United States)
Yuli Vladimirsky, Louisiana State Univ. (United States)

Published in SPIE Proceedings Vol. 2880:
Microlithography and Metrology in Micromachining II
Michael T. Postek Jr.; Craig R. Friedrich, Editor(s)

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