Proceedings Paper • Open Access
Multi-beam – enabling leading-edge mask writing (Conference Presentation) (Withdrawal Notice)
Paper Abstract
This conference presentation, originally published on 10 October 2018, was withdrawn per author request.
Paper Details
Date Published: 31 October 2018
PDF: 1 pages
Proc. SPIE 10810, Photomask Technology 2018, 108100I (31 October 2018); doi: 10.1117/12.2503330
Published in SPIE Proceedings Vol. 10810:
Photomask Technology 2018
Emily E. Gallagher; Jed H. Rankin, Editor(s)
PDF: 1 pages
Proc. SPIE 10810, Photomask Technology 2018, 108100I (31 October 2018); doi: 10.1117/12.2503330
Show Author Affiliations
Christoph Spengler, IMS Nanofabrication GmbH (Austria)
Elmar Platzgummer, IMS Nanofabrication GmbH (Austria)
Elmar Platzgummer, IMS Nanofabrication GmbH (Austria)
Hans Loeschner, IMS Nanofabrication GmbH (Austria)
Published in SPIE Proceedings Vol. 10810:
Photomask Technology 2018
Emily E. Gallagher; Jed H. Rankin, Editor(s)
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