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Proceedings Paper • Open Access

Multi-beam – enabling leading-edge mask writing (Conference Presentation) (Withdrawal Notice)
Author(s): Christoph Spengler; Elmar Platzgummer; Hans Loeschner

Paper Abstract

This conference presentation, originally published on 10 October 2018, was withdrawn per author request.

Paper Details

Date Published: 31 October 2018
PDF: 1 pages
Proc. SPIE 10810, Photomask Technology 2018, 108100I (31 October 2018); doi: 10.1117/12.2503330
Show Author Affiliations
Christoph Spengler, IMS Nanofabrication GmbH (Austria)
Elmar Platzgummer, IMS Nanofabrication GmbH (Austria)
Hans Loeschner, IMS Nanofabrication GmbH (Austria)

Published in SPIE Proceedings Vol. 10810:
Photomask Technology 2018
Emily E. Gallagher; Jed H. Rankin, Editor(s)

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