Proceedings Paper
Experimental evaluation of the impact of EUV pellicles on reticle imaging| Format | Member Price | Non-Member Price |
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Paper Abstract
The purpose of EUV pellicles is to protect the surface of EUV lithography masks from particle contamination. Currently several pellicle prototypes are being developed. It is important to ensure that the optical characteristics of the pellicle membrane do not critically affect the reticle image quality. We present here a study of the impact of a few selected EUV pellicle prototypes on the quality and the contrast of the reticle image obtained with an actinic lensless microscope.
Paper Details
Date Published: 3 October 2018
PDF: 9 pages
Proc. SPIE 10810, Photomask Technology 2018, 108100Y (3 October 2018); doi: 10.1117/12.2502480
Published in SPIE Proceedings Vol. 10810:
Photomask Technology 2018
Emily E. Gallagher; Jed H. Rankin, Editor(s)
PDF: 9 pages
Proc. SPIE 10810, Photomask Technology 2018, 108100Y (3 October 2018); doi: 10.1117/12.2502480
Show Author Affiliations
Iacopo Mochi, Paul Scherrer Institut (Switzerland)
Marina Timmermans, IMEC (Belgium)
Emily Gallagher, IMEC (Belgium)
Marina Mariano Juste, IMEC (Belgium)
Ivan Pollentier, IMEC (Belgium)
Marina Timmermans, IMEC (Belgium)
Emily Gallagher, IMEC (Belgium)
Marina Mariano Juste, IMEC (Belgium)
Ivan Pollentier, IMEC (Belgium)
Rajendran Rajeev, Paul Scherrer Institut (Switzerland)
Patrick Helfenstein, Paul Scherrer Institut (Switzerland)
Sara Fernandez, Paul Scherrer Institut (Switzerland)
Dimitrios Kazazis, Paul Scherrer Institut (Switzerland)
Yasin Ekinci, Paul Scherrer Institut (Switzerland)
Patrick Helfenstein, Paul Scherrer Institut (Switzerland)
Sara Fernandez, Paul Scherrer Institut (Switzerland)
Dimitrios Kazazis, Paul Scherrer Institut (Switzerland)
Yasin Ekinci, Paul Scherrer Institut (Switzerland)
Published in SPIE Proceedings Vol. 10810:
Photomask Technology 2018
Emily E. Gallagher; Jed H. Rankin, Editor(s)
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