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Proceedings Paper

A tool for full area inband EUV transmission mapping of EUV pellicles
Author(s): C. Pampfer; A. Biermanns-Föth; T. Missalla; J. Arps; C. Phiesel; C. Piel; R. Lebert
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Paper Abstract

The scene is set for EUV lithography high volume production. EUV masks with pellicles and scanners with dynamic gas lock thin film windows are considered a corner stone for insertion. For making the thin films usable in EUV scanners, EUV actinic metrology with high precision and accuracy is required to qualify them. One of the key features is the uniformity of the transmission at 13.5 nm through the thin film membrane to be qualified over the entire area. The specification for the required tool is qualifying a full sized EUV pellicle with an average EUV transmission of around 90 % to a uniformity of < 99.6 % – hence precision and accuracy of the process of below 0.1 % are demanded. Certainly, no particles should be added to the EUV pellicle by the qualification measurement. Within RI Research Instrument’s support of EUVL infrastructure by developing actinic metrology solutions, we have built a dedicated tool for EUV pellicle transmission characterization using the effective inband EUV scheme. The actinic measurement of the full pellicle is accomplished in less than 40 minutes. Vacuum loading and unloading consumes another 35 minutes due to the need of extreme care for such fragile samples and to avoid contamination. First images of full sized pellicles show precision and accuracy of better 0.1 % for a qualification pixel resolution of 300x300 μm2.

Paper Details

Date Published: 3 October 2018
PDF: 9 pages
Proc. SPIE 10809, International Conference on Extreme Ultraviolet Lithography 2018, 108091E (3 October 2018); doi: 10.1117/12.2501804
Show Author Affiliations
C. Pampfer, RI Research Instruments GmbH (Germany)
A. Biermanns-Föth, RI Research Instruments GmbH (Germany)
T. Missalla, RI Research Instruments GmbH (Germany)
J. Arps, RI Research Instruments GmbH (Germany)
C. Phiesel, RI Research Instruments GmbH (Germany)
C. Piel, RI Research Instruments GmbH (Germany)
R. Lebert, RI Research Instruments GmbH (Germany)

Published in SPIE Proceedings Vol. 10809:
International Conference on Extreme Ultraviolet Lithography 2018
Kurt G. Ronse; Eric Hendrickx; Patrick P. Naulleau; Paolo A. Gargini; Toshiro Itani, Editor(s)

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