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Proceedings Paper

Excimer lasers for deep-UV lithography
Author(s): David J. Elliott; Uday K. Sengupta
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Paper Abstract

Krypton Fluoride exciTner laser-based wafer steppers are now expected to extend optical microlithography to sub-0. 5pra design rules in VLSI chip fabrication. The performance and operational requireraents for the excinter laser for this application are very stringent and different from conventional excimer lasers. For practical reasons the stepper requires that the spectral bandwidth of the laser be reduced to less than 3pm while the wavelength is stabilized to better than +/0. Spm. This paper will discuss these issues and the design features of such an excimer laser. This paper also addresses issues relating to the integration of this laser with a wafer stepper and operation in a wafer fabricatio''n environment

Paper Details

Date Published: 1 March 1991
PDF: 12 pages
Proc. SPIE 1377, Excimer Laser Materials Processing and Beam Delivery Systems, (1 March 1991); doi: 10.1117/12.25017
Show Author Affiliations
David J. Elliott, Cymer Laser Technologies (United States)
Uday K. Sengupta, Cymer Laser Technologies (United States)

Published in SPIE Proceedings Vol. 1377:
Excimer Laser Materials Processing and Beam Delivery Systems
Bernhard P. Piwczyk, Editor(s)

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