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Proceedings Paper

Upgrade plan of cERL for the POC as a first stage of the development on EUV-FEL high power light source (Conference Presentation)

Paper Abstract

It is important to develop the high power EUV light source up to 1 kW to realize the 3nm node to reduce stochastic variation and achieve a higher through put. To this end, we have proposed an energy recovery linac (ERL)-based free electron laser (FEL) ,which will produce more than 10 kW EUV light to provide the light into several scanners. We studied the feasibilities to reduce the size of the accelerator system itself, and the part of them was presented at the previous symposium last year. And we also gave an idea to develop the POC of the ERL-FEL by using compact ERL (cERL) as a first stage of the EUV-FEL. In this paper, we present the upgrade plan of cERL for the POC. The technologies to be clarified are both of to realize the SASE-FEL based on the ERL and to achieve short electron bunch around 100fs for EUV-FEL light generation. The former is that the energy of the electron beams after the FEL generation can be recovered with the ERL accelerator systems with the high repetition rate such as more than 100MHz. The POC will be completed at the wavelength of near infrared, because of the size limitation of the cERL. The latter will be also realized at the cERL by the bunch compression scheme using a combination of electron beams with a momentum chirp and magnet assemblies with a non-zero longitudinal dispersion. The design values of the upgrade are as follows; the energy of the recirculation electron is 80 MeV, energy of the injection electron is 5 MeV, wavelength of the FEL is 1.35 micron, electron beam current is 10mA, bunch charge is 60 pC/bunch, repetition rate is 162.5 MHz. We have already studied the electron trajectory by using simulation, and checked the feasibilities. We will give detailed studies on the POC.

Paper Details

Date Published: 12 October 2018
Proc. SPIE 10809, International Conference on Extreme Ultraviolet Lithography 2018, 1080908 (12 October 2018);
Show Author Affiliations
Hiroshi Kawata, High Energy Accelerator Research Organization, KEK (Japan)
Norio Nakamura, High Energy Accelerator Research Organization, KEK (Japan)
Ryukou Kato, High Energy Accelerator Research Organization, KEK (Japan)

Published in SPIE Proceedings Vol. 10809:
International Conference on Extreme Ultraviolet Lithography 2018
Kurt G. Ronse; Eric Hendrickx; Patrick P. Naulleau; Paolo A. Gargini; Toshiro Itani, Editor(s)

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