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Proceedings Paper

Gratings theory for pico-optics applications
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Paper Abstract

Grating theory is normally designed for nano/microoptics applications. If we consider the further smaller size, we might enter the area of picometer optics. Although it seems picometer optics might be the frontier of developing nanooptics devices into the next step, it is hard to make picometer optical devices previously. We will report a series of three works that can lead us into the picometer scale. The first is to fabricate high-density gratings whose periods can be controlled to be slightly different in picometer range, which is done by rotating Dammann grating in a microrad angle for achieving the grating period continuously tuned in picometer scale. The second is to propose carrier pico-grating array for measuring the distances of the moving grating, which can be done in picometer accuracy. The third is to measure the wavefront of two-beam interferences in picometer accuracy, which is far beyond the current normal laser interferometer. Initial experimental results demonstrated that the wavefront has been measured with 250pm linear phase difference, which is impossible to obtain with the traditional laser interferometer. Taking consideration of these picometer works together, we believe that picometer optics should come with these picometer optical tools further extended in the near future.

Paper Details

Date Published: 6 November 2018
PDF: 9 pages
Proc. SPIE 10818, Holography, Diffractive Optics, and Applications VIII, 108180G (6 November 2018); doi: 10.1117/12.2500319
Show Author Affiliations
Changhe Zhou, Shanghai Institute of Optics and Fine Mechanics (China)
Minkang Li, Shanghai Institute of Optics and Fine Mechanics (China)
Xiansong Xiang, Shanghai Institute of Optics and Fine Mechanics (China)
Chunlong Wei, Shanghai Institute of Optics and Fine Mechanics (China)
Wei Jia, Jinan Univ. (China)
Changcheng Xiang, Jinan Univ. (China)

Published in SPIE Proceedings Vol. 10818:
Holography, Diffractive Optics, and Applications VIII
Yunlong Sheng; Chongxiu Yu; Changhe Zhou, Editor(s)

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