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Proceedings Paper

Development of adaptively mixed thin film (AMTF) deposited by a dielectric material and a plastic (Conference Presentation)
Author(s): Kunio Yoshida; Takayuki Okamoto; Takuya Mikami; Hidetsugu Yoshida; Junji Kawanaka; Noriaki Miyanaga; Shinji Motokoshi; Takahisa Jitsuno

Paper Abstract

We had developed a unique porous thin films by a special coating method1. In this technique, two dielectric materials A and B having different refractive indices nA and nB ,where nA>nB are simultaneously deposited in vacuum on a substrate such as fused silica or optical glasses. Then the coated surface is processed in ultra-pure water which preferentially dissolves the material B. These processes result in a porous thin film which has gradient refractive index and has the antireflection (AR) property over broad bandwidth. The porous coating obtained by this method cannot apply depositing a multilayered dielectric thin film. We have developed a novel method. The present technique, a dielectric material D and a plastic P are simultaneously deposited in vacuum on a heated-substrate such as fused silica, ceramic or optical glasses. Then the coated surface forms an adaptively mixed thin film ( AMTF ) with dielectric material and plastic. In this coating process, plastics partially evaporate due to the heated-substrate. The refractive index of the coated AMTF mainly decided by the mixing ratio of the dielectric material and plastic. In our samples the damage threshold was confirmed to be 115 J/cm2 at 10 ns and λ=1064 nm. The band width of AMTF with MgF2 and Teflon (AMTF: MgF2 ) was confirmed to cover from 200 to 8000 nm. This AMTF: MgF2 can be applicable not only to AR thin film, but to a high reflectance mirror and polarizer in various high intensity laser syetems. 1K.Yoshida, H.Yoshida, Y.Kato, and C.Yamanaka, Appl.Phy.Lett.47,911(1985)

Paper Details

Date Published: 26 November 2018
Proc. SPIE 10805, Laser-Induced Damage in Optical Materials 2018: 50th Anniversary Conference, 1080513 (26 November 2018); doi: 10.1117/12.2500273
Show Author Affiliations
Kunio Yoshida, Osaka Univ. (Japan)
Okamoto Optics Works, Inc. (Japan)
Takayuki Okamoto, Okamoto Optics Works, Inc. (Japan)
Takuya Mikami, Okamoto Optics Works, Inc. (Japan)
Hidetsugu Yoshida, Osaka Univ. (Japan)
Junji Kawanaka, Osaka Univ. (Japan)
Noriaki Miyanaga, Osaka Univ. (Japan)
Shinji Motokoshi, Institute for Laser Technology (Japan)
Takahisa Jitsuno, Osaka Univ. (Japan)

Published in SPIE Proceedings Vol. 10805:
Laser-Induced Damage in Optical Materials 2018: 50th Anniversary Conference
Christopher Wren Carr; Gregory J. Exarhos; Vitaly E. Gruzdev; Detlev Ristau; M.J. Soileau, Editor(s)

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