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Proceedings Paper

E-beam tandem writes short-pitch DOEs and gratings for EU-922 FOTA and other optical microsystems
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Paper Abstract

Short grating period and high spatial frequency zones in holograms are features which diffractive elements must exhibit to be considered as the core of future optical microsystems. Wavelength scale feature size is the way to system miniaturization, to large aperture and high efficiency as well as to simplicity. The implication is a systematic resort to electron beam lithography (EBL). A tandem of two EBL tools is shown to fit the specific requirements of diffractive optics and to allow the exploitation of the application potential of this technology.

Paper Details

Date Published: 26 August 1996
PDF: 8 pages
Proc. SPIE 2783, Micro-Optical Technologies for Measurement, Sensors, and Microsystems, (26 August 1996); doi: 10.1117/12.248504
Show Author Affiliations
Ernst-Bernhard Kley, Friedrich-Schiller-Univ. Jena (Germany)
Olivier M. Parriaux, Friedrich-Schiller-Univ. Jena (Germany)

Published in SPIE Proceedings Vol. 2783:
Micro-Optical Technologies for Measurement, Sensors, and Microsystems
Olivier M. Parriaux, Editor(s)

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