Proceedings Paper
Optical coatings for UV photolithography systems| Format | Member Price | Non-Member Price |
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Paper Abstract
The performance of UV photolithography lens-systems with usually several ten optical components is limited by both the quality of the substrates and by the quality of the optical coatings. The key problems are the quality of the reflectance over large and strongly curved surfaces, the absorption and scatter losses and the behavior during heavy UV irradiation in production lines.
Paper Details
Date Published: 19 August 1996
PDF: 13 pages
Proc. SPIE 2776, Developments in Optical Component Coatings, (19 August 1996); doi: 10.1117/12.246823
Published in SPIE Proceedings Vol. 2776:
Developments in Optical Component Coatings
Ian Reid, Editor(s)
PDF: 13 pages
Proc. SPIE 2776, Developments in Optical Component Coatings, (19 August 1996); doi: 10.1117/12.246823
Show Author Affiliations
Norbert Kaiser, Fraunhofer-Institut fuer Angewandte Optik und Feinmechanik (Germany)
Published in SPIE Proceedings Vol. 2776:
Developments in Optical Component Coatings
Ian Reid, Editor(s)
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