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Proceedings Paper

Approaches explored for producing a variety of ion-assisted deposited thin film coatings using an end-Hall ion source
Author(s): Michael L. Fulton; Davood Heshmaty-Manesh; Raymond Mitchell
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Paper Abstract

The variety of optical components produced using this ion- assisted-deposition (IAD) technique, spans a wide ken of applications: immersed beamsplitters; band pass and edge filters; laser filters; IR windows; durable anti-reflection filters, fiber optics, and enhanced metals. Each product type has a specific set of constraints that establishes the design and production strategy: substrate type, material indices, intrinsic stress, temperature, distribution, uniformity, thickness monitoring, spectral performance specification, and environmental requirements. The end-Hall IAD processes were performed using an ion-beam current of approximately one Ampere over a range of 40 to 120eV, providing a uniform ion current density impinging on a large substrate area. Compared to films deposited using either conventional physical vapor deposition, or standard gridded ion sources, this process produces optically stable films with abroad ion-beam that is well suited for volume manufacturing of complex optical coatings.

Paper Details

Date Published: 19 August 1996
PDF: 12 pages
Proc. SPIE 2776, Developments in Optical Component Coatings, (19 August 1996); doi: 10.1117/12.246808
Show Author Affiliations
Michael L. Fulton, Avimo Electro-Optics Pte. Ltd. (Singapore)
Davood Heshmaty-Manesh, Avimo Ltd. (United Kingdom)
Raymond Mitchell, Avimo Ltd. (United Kingdom)

Published in SPIE Proceedings Vol. 2776:
Developments in Optical Component Coatings
Ian Reid, Editor(s)

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