An improved plasma source for use with oxygen and other gasses has shown great stability at ion power levels almost an order of magnitude above those of the other commercially available gridless sources. The original motivation of this work was to obtain a powerful a source of oxygen ions with neutralizing electrons (plasma source) for the reactive deposition of SiO₂ from SiO. The results are also applicable to other gasses such as nitrogen, argon, etc., and other deposition materials. The characterization of the source in detail by the use of the design of experiments methodology is discussed.

Date Published: 19 August 1996
PDF: 8 pages
Proc. SPIE 2776, Developments in Optical Component Coatings, (19 August 1996); doi: 10.1117/12.246807

Published in SPIE Proceedings Vol. 2776:
Developments in Optical Component Coatings
Ian Reid, Editor(s)