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Proceedings Paper

Transmittance measurement with interferometer system
Author(s): Hideo Takizawa; Haruhiko Kusunose; Naoki Awamura; Kouji Miyazaki; Takahiro Ode; Daikichi Awamura
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Paper Abstract

Transmittance measurement of small object such as Ga-stain of repair or particle on photomask is getting to be important. This paper. describes the characteristic of transmittance measurement with a shearing interferometer microscope comparing with a conventional method. Measurement wavelength are 436, 365 and 248nm. In this system the transmittance is calculated from interference signal amplitude that is free from a flare light caused by reflection of optical parts.

Paper Details

Date Published: 24 July 1996
PDF: 8 pages
Proc. SPIE 2793, Photomask and X-Ray Mask Technology III, (24 July 1996); doi: 10.1117/12.245226
Show Author Affiliations
Hideo Takizawa, Lasertec Corp. (Japan)
Haruhiko Kusunose, Lasertec Corp. (Japan)
Naoki Awamura, Lasertec Corp. (Japan)
Kouji Miyazaki, Lasertec Corp. (Japan)
Takahiro Ode, Lasertec Corp. (Japan)
Daikichi Awamura, Lasertec Corp. (Japan)

Published in SPIE Proceedings Vol. 2793:
Photomask and X-Ray Mask Technology III
Hideo Yoshihara, Editor(s)

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