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Proceedings Paper

DUV printability of laser repairs on binary and attenuated phase-shift masks
Author(s): James A. Reynolds; Franklin M. Schellenberg; Michael S. Hibbs; Dennis Hayden
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Paper Abstract

Photomask repair is a key technology required for the advancement of semiconductor lithography. Of particular interest is the repair of attenuated phase shift masks (APSM) which appear to have a significant role in extending the life of lithographic equipment and processes. A majority of today's 5X reticles require some type of repair to meet zero defect requirements. A successful repair must add and/or remove materials so the aerial image of the defective site looks, to the printing process, to be identical to that of a nondefective site. In this study, selected defects from an IBM test pattern were removed from a carbon attenuated phase shift mask ("carbon phase mask”) and a conventional binary mask (“chromeonglass mask"). The mask was inspected using an atomic force microscope (AFM) and an aerial image measurement (AIMS) system and were printed at a 248nm wavelength onto silicon wafers. The finished wafers were inspected using a scanning electron microscope (SEM) to determine the printability of repaired sites.

Paper Details

Date Published: 24 July 1996
PDF: 12 pages
Proc. SPIE 2793, Photomask and X-Ray Mask Technology III, (24 July 1996); doi: 10.1117/12.245225
Show Author Affiliations
James A. Reynolds, Reynolds Consulting (United States)
Franklin M. Schellenberg, Hewlett-Packard Labs. (United States)
Michael S. Hibbs, IBM Corp. (United States)
Dennis Hayden, IBM Corp. (United States)

Published in SPIE Proceedings Vol. 2793:
Photomask and X-Ray Mask Technology III
Hideo Yoshihara, Editor(s)

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