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Proceedings Paper

Removable organic antireflection coating
Author(s): John L. Sturtevant; Linda J. Insalaco; Tony D. Flaim; Vandana N. Krishnamurthy; James D. Meador; John S. Petersen; Andrew R. Eckert
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Paper Abstract

Preliminary studies with Brewer Science CD9 ARC have shown that high-intensity ultraviolet exposure results in significant changes in film properties, including thickness, plasma etch resistance, and develop rate. This process has been studied over a range of temperatures and exposure conditions, and their results are interpreted in terms of competing polymer main chain scission and crosslinking reactions. The process represents a path to improved etch performance, and the possibility exists for use of Brewer ARC in a bi-layer portable conformable mask resist scheme.

Paper Details

Date Published: 14 June 1996
PDF: 9 pages
Proc. SPIE 2724, Advances in Resist Technology and Processing XIII, (14 June 1996); doi: 10.1117/12.241872
Show Author Affiliations
John L. Sturtevant, SEMATECH (United States)
Linda J. Insalaco, Fusion Systems (United States)
Tony D. Flaim, Brewer Science Inc. (United States)
Vandana N. Krishnamurthy, Brewer Science Inc. (United States)
James D. Meador, Brewer Science Inc. (United States)
John S. Petersen, Shipley Co. Inc. (United States)
Andrew R. Eckert, Univ. of Texas/Austin (United States)

Published in SPIE Proceedings Vol. 2724:
Advances in Resist Technology and Processing XIII
Roderick R. Kunz, Editor(s)

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