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Proceedings Paper

Standing waves reducing additives
Author(s): Medhat A. Toukhy; G. McCormick
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Paper Abstract

Small molecules added to novolak/diazonaphthoquinone based resists plasticize their dry film coatings. This has a significant effect on standing waves reduction. Such additives allow the photo active compounds (PACs) to diffuse at reduced temperatures. Raw dissolution rate data is highly reliable for detecting standing waves. The effect of the additives on standing waves reduction is a direct function of their molar concentration in the film. Additives that are more alkaline soluble than the novolak matrix are generally preferred to avoid reducing the resist photo speed. These additives may cause serious loss in resist inhibition unless the interaction efficiency of the novolak/PAC system is sufficiently high. Non-reflective substrates are necessary to isolate and examine the effect of additives on resist dissolution without thermal or standing wave interferences. Optimal resist formulations using such additives provide high contrast systems with reduced standing waves applied over reflective substrates.

Paper Details

Date Published: 14 June 1996
PDF: 9 pages
Proc. SPIE 2724, Advances in Resist Technology and Processing XIII, (14 June 1996); doi: 10.1117/12.241852
Show Author Affiliations
Medhat A. Toukhy, Olin Microelectronic Materials (United States)
G. McCormick, Olin Microelectronic Materials (United States)

Published in SPIE Proceedings Vol. 2724:
Advances in Resist Technology and Processing XIII
Roderick R. Kunz, Editor(s)

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