Share Email Print

Proceedings Paper

Application of photodecomposable base concept to two-component deep-UV chemically amplified resists
Author(s): Satoru Funato; N. Kawasaki; Yoshiaki Kinoshita; Seiya Masuda; Hiroshi Okazaki; Munirathna Padmanaban; T. Yamamoto; Georg Pawlowski
Format Member Price Non-Member Price
PDF $17.00 $21.00

Paper Abstract

The use of photodecomposable bases (PDB) offers distinct benefits to the general lithographic performance, and in particular, to the stability of the latent image in positive tone chemically amplified deep UV resists (CAR). The PDB concept utilizes radiation sensitive basic compounds, such as triphenylsulfonium hydroxide (TPSOH), which are coformulated as additives to the resist formulation. In the exposed resist sectors the PDB is decomposed into neutral fragments, which do not interfere with the simultaneously produced acid from the photolyzed photoacid generator (PAG). In the unexposed regions the PDB remains active and effectively neutralizes acid molecules diffusing into these areas. The successful integration of the PDB concept into acetal-based three component systems has been described previously. Its usefulness for standard two component materials, consisting of a polymer partly reacted with acid-labile protective groups, such s t-BOC or acteal/ketal protected ploy-4-hydroxystyrene (PHS), and a PAG is investigated in this paper. The effects of the PDB on the latent image stability, and additional resist properties, such as transparency, sensitivity, contrast, standing waves, etc. are discussed in detail. Finally, a new high performance deep UV CAR material incorporating the PDB concept is presented.

Paper Details

Date Published: 14 June 1996
PDF: 10 pages
Proc. SPIE 2724, Advances in Resist Technology and Processing XIII, (14 June 1996); doi: 10.1117/12.241816
Show Author Affiliations
Satoru Funato, Hoechst Industry Ltd. (Japan)
N. Kawasaki, Hoechst Industry Ltd. (Japan)
Yoshiaki Kinoshita, Hoechst Industry Ltd. (Japan)
Seiya Masuda, Hoechst Industry Ltd. (Japan)
Hiroshi Okazaki, Hoechst Industry Ltd. (Japan)
Munirathna Padmanaban, Hoechst Industry Ltd. (Japan)
T. Yamamoto, Hoechst Industry Ltd. (Japan)
Georg Pawlowski, Hoechst Industry Ltd. (Japan)

Published in SPIE Proceedings Vol. 2724:
Advances in Resist Technology and Processing XIII
Roderick R. Kunz, Editor(s)

© SPIE. Terms of Use
Back to Top
Sign in to read the full article
Create a free SPIE account to get access to
premium articles and original research
Forgot your username?