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Proceedings Paper

Integrated CAD framework linking VLSI layout editors and process simulators
Author(s): Chaitali Sengupta; Miklos Erdelyi; Zsolt Bor; Joseph R. Cavallaro; Michael C. Smayling; Gabor Szabo; Frank K. Tittel; William L. Wilson Jr.
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Paper Abstract

As feature sizes in VLSI circuits extend into the far sub-micron range, new process techniques, such as using phase shifted masks for photolithography, will be needed. Under these conditions, the only means for the circuit designer to design compact and efficient circuits with good yield capabilities is to be able to see the effect of different design approaches on manufactured silicon, instead of solely relying on conservative general design rules. The integrated CAD framework accomplishes this by providing a link between a layout editor (Magic), advanced photolithographic techniques such as phase shifted masks, and a process simulator (Depict). This paper discusses some applications of this tool. A non- conventional process technique involving interferometric phase shifting and off-axis illumination has been evaluated using the tool. Also, a feature of the CAD framework which allows representation of a phase shifted mask, together with its layout analysis capability has been used to compact a piece of layout by inserting phase shifted elements into it.

Paper Details

Date Published: 7 June 1996
PDF: 9 pages
Proc. SPIE 2726, Optical Microlithography IX, (7 June 1996); doi: 10.1117/12.240955
Show Author Affiliations
Chaitali Sengupta, Rice Univ. (United States)
Miklos Erdelyi, Jozsef Attila Univ. (Hungary)
Zsolt Bor, Jozsef Attila Univ. (Hungary)
Joseph R. Cavallaro, Rice Univ. (United States)
Michael C. Smayling, Rice Univ. (United States)
Gabor Szabo, Jozsef Attila Univ. (Hungary)
Frank K. Tittel, Rice Univ. (United States)
William L. Wilson Jr., Rice Univ. (United States)

Published in SPIE Proceedings Vol. 2726:
Optical Microlithography IX
Gene E. Fuller, Editor(s)

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